Protect your process with the HALO QRPModern semiconductor deposition processes—from low-temperature epitaxy to MOCVD—operate routinely at chamber pressures far below atmosphere and approach the single-digit torr range. At the same time, process temperatures are continuously decreasing. Under these conditions, residual moisture in the chamber poses a significant threat to process quality and production yields.

Tiger Optics’ new HALO QRP is optimized to operate under these low-pressure conditions and deliver exact and reliable real-time measurement to verify moisture residue in, for example, the load lock, transfer and process chambers before H2O contaminants compromise the subsequent process step. Based on Tiger Optics’ proven Continuous-Wave Cavity Ring-Down Spectroscopy (CW-CRDS) technology, the HALO QRP sets new standards in ease-of-use and measurement precision for this application, and operates at chamber pressures as low as 1 Torr.

Designed for trace level moisture analysis in low pressure (<50 Torr) applications, the HALO QRP offers:

• Moisture detection at partial pressure of 1 µTorr and below
• Absolute accuracy and excellent precision
• Wide dynamic range – over four orders of magnitude
• Low cost of ownership and operational simplicity
• Clean technology – no external calibration gases required
• Compact analyzer footprint, also available as OEM module for equipment/system integration

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